Feb. 24, 2026 – ASML Holding NV, the Dutch chip-equipment leader, has made a significant breakthrough in its extreme ultraviolet (EUV) lithography systems, potentially widening its technological lead over competitors, according to Citi analysts.

The company has developed a method to increase the light source power in EUV machines from 600 watts to 1,000 watts, which could allow semiconductor manufacturers to produce more silicon wafers. ASML, however, classifies this achievement as a research milestone, not yet a commercial product, and cautions that industrializing the advancement for customers will take several years.

Citi analysts note that the development underscores ASML’s dominance in cutting-edge lithography technology, which remains a critical enabler of next-generation semiconductor production. The company’s ability to maintain a lead in EUV systems continues to support its role as a key supplier to major chipmakers worldwide.